# Target per sputtering

Una gamma completa di target per sputtering, dal grado commerciale all’ultra-puro, realizzati per qualsiasi sistema o su misura.

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## Target di metalli puri

Al, Sb, Bi, B, Cd, Ce, Cr, Co, Cu, Dy, Er, Eu, Gd, Ge, Au, C, Hf, Ho, Ir, In, Fe, La, Pb, Lu, Mn, Mo, Mg, Nd, Nb, Ni, Pd, Pt, Pr, Re, Ru, Sm, Sc, Se, Si, Ag, Ta, Tb, Te, Sn, Tm, Ti, W, V, Yb, Y, Zr, Zn.

## Target in lega

AlCu, AlCr, AlMg, AlSi, CoCr, CoCrMo, CoFe, CoFeB, CoNi, CoPt, CrSi, CuGa, CuIn, CuNi, IrMn, MoSi, NiAl, NiCr, NiFe, NiTi, SmCo, TiAl, TiNi, WRe, WTi, ZrAl e composizioni su misura.

## Target ceramici

Boruri: CrB₂, HfB₂, LaB₆, TiB₂, ZrB₂. Carburi: B₄C, Cr₃C₂, HfC, SiC, TaC, TiC, WC, ZrC. Nitruri: AlN, BN, GaN, HfN, Si₃N₄, TaN, TiN, ZrN.

## Target di ossidi

Al₂O₃, BaTiO₃, CeO₂, Cr₂O₃, HfO₂, In₂O₃, ITO, Fe₂O₃, MgO, Nd₂O₃, SiO₂, SrTiO₃, Ta₂O₅, TiO₂, SnO₂, WO₃, Y₂O₃, ZnO, ZrO₂ e altri.

## Seleniuri, solfuri, tellururi, fluoruri

Bi₂Se₃, CdSe, ZnSe, MoSe₂, CdS, MoS₂, ZnS, Bi₂Te₃, CdTe, GeTe, PbTe, AlF₃, CaF₂, MgF₂, YF₃ e altri.

## Su ordinazione

AZO, Cr-SiO, CIGS, ITO, IGZO, GaAs, GaP, GaSb, InSb, InAs, InP, LSMO, YBCO, LCMO, YSZ, GeSbTe e altri.

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